- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
- G03F 1/76 - Patterning of masks by imaging
Patent holdings for IPC class G03F 1/76
Total number of patents in this class: 179
10-year publication summary
|
16
|
26
|
20
|
21
|
20
|
11
|
12
|
18
|
13
|
6
|
| 2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Taiwan Semiconductor Manufacturing Company, Ltd. | 36809 |
34 |
| Shin-Etsu Chemical Co., Ltd. | 5132 |
12 |
| Boe Technology Group Co., Ltd. | 35384 |
9 |
| FUJIFILM Corporation | 27102 |
7 |
| Applied Materials, Inc. | 16587 |
7 |
| Lam Research Corporation | 4775 |
7 |
| Kioxia Corporation | 9847 |
7 |
| Google LLC | 38759 |
5 |
| Samsung Electronics Co., Ltd. | 131630 |
4 |
| Texas Instruments Incorporated | 19376 |
4 |
| Hoya Corporation | 2822 |
4 |
| Synopsys, Inc. | 2829 |
3 |
| Hefei BOE Optoelectronics Technology Co., Ltd. | 1346 |
3 |
| Samsung Display Co., Ltd. | 30585 |
2 |
| LG Chem, Ltd. | 17205 |
2 |
| Canon Inc. | 36841 |
2 |
| Intel Corporation | 45621 |
2 |
| ASML Netherlands B.V. | 6816 |
2 |
| United Microelectronics Corp. | 3921 |
2 |
| Tsinghua University | 5426 |
2 |
| Other owners | 59 |